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Chromium Silicide, CrSi2 

Release time :2016/05/10
Chromium Silicide, CrSi2


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Chromium disilicide

Application of chromium disilicide in the preparation of ceramic materials by 

pyrolysis of Polycarbosilane as precursor

Chromium disilicide powder can promote the cracking reaction of PCs, 

increase the ceramic yield of the precursor, reduce the linear shrinkage of the 

precursor in the pyrolysis process, and improve the properties of ceramic materials.

The main uses of chromium silicide are as follows

It can be used as ceramic material and high resistance film material.

The product properties of chromium silicide are as follows

Chromium silicide film has high resistivity and low resistance temperature coefficient. 

Gray cubic crystal, hexagonal system, melting point close to 1550 ℃, the bonding 

form in crystal is similar to Cr3Si, metallic luster, insoluble in hydrochloric acid and 

aqua regia.

Chromium silicide film has high resistivity and low resistance temperature coefficient.


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