+86-15698999555
中文|English
Home Company
Honor
Products
Case
News
Purchase
Online
Contact us
products

products

Cobalt Silicide, CoSi2 

Release time :2020/06/29
Cobalt Silicide, CoSi2

海鑫產品介紹.jpg


海鑫COA.jpg

硅化鈷COA_600.png

海鑫XRD.jpg

二硅化鈷.jpg

海鑫SIZE.jpg

硅化鈷粒度英文--水印600.png

微信圖片_20200717143823.jpg

Cobalt disilicide
 
The chemical formula CoSi2. The molecular weight is 115.11. Dark brown orthorhombic crystal. 

The melting point is 1277 ℃, and the relative density is 5.3. It can be oxidized at 1200 ℃ and erode 

its surface;
 
It reacts with chlorine at 300 ℃. It is eroded by hydrogen fluoride, dilute and concentrated nitric acid 

and sulfuric acid, and can also be severely eroded by molten strong alkali. It acts slowly with boiling 

hot concentrated hydrochloric acid. CoSi2, with low resistivity and good thermal stability, is widely 

used as a contact in LSI. Moreover, CoSi2 has a crystal structure similar to that of Si, so it can form 

epitaxial CoSi2 / Si structure on Si substrate to study the interface characteristics of epitaxial metal 

silicon. Silicide nanostructures have potential applications in a series of fields of nanoelectronics: 

semiconductor silicide nanostructures (FeSi2) can be used to prepare nano electronic active devices, 

which may have very important applications in silicon-based nano light-emitting devices; and metallic 

silicides (CoSi2, Nisi2) can be used as nanowires in quantum computers and fault-tolerant terahertz 

nano circuit computers in the future. Because epitaxial silicide wires can be prepared on silicon 

substrates, their properties will be greatly improved compared with ordinary metal nanowires because 

there is no grain boundary; metallic 

亚洲 图片 另类 综合 小说

    <pre id="wxp7k"></pre>

      <code id="wxp7k"></code><th id="wxp7k"><video id="wxp7k"></video></th>

        <object id="wxp7k"></object>

        <th id="wxp7k"><option id="wxp7k"></option></th><object id="wxp7k"></object>