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Hafnium Nitride Powder, HfN 

Release time :2015/11/17
Hafnium Nitride Powder, HfN









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Hafnium nitride; Hafnium nitride HfN
Properties: gray powder, cubic crystal structure. Melting point 3310℃, microhardness 

16GPa. Quite stable, but easy to aqua regia, concentrated sulfuric acid, hydrofluoric 

acid corrosion. High purity, small particle size, uniform distribution, large specific surface 

area, high surface activity, gray powder, cubic crystal structure. Microhardness 16GPa. 

Produced by a direct reaction of hafnium and nitrogen at 900℃, or by a reaction of 

hafnium halides and ammonia or a mixture of nitrogen and hydrogen. Hafnium alloy 

is an important component of refractory compound.
Product application:
Hafnium nitride has excellent mechanical, electrical, optical, high temperature and 

corrosion resistance characteristics, and has very important applications in the field 

of mechanical manufacturing and microelectronics. Hafnium nitride nanometer can 

be widely used in semiconductor, photoelectric and machining fields. Because of 

the integration of a variety of excellent mechanical, thermal, optical and corrosion 

wear resistance characteristics, the hafnium nitride nanometer film is expected to 

become an efficient optical window anti-reflection protection coating material, can 

be used in aerospace key optical devices. HfN is a new type of hard material with 

high melting point, high hardness, wear resistance and oxidation resistance. It can 

be used as protective layer for technical and decorative fields, abrasion resistant 

outer film for cutting tools, chemical inert film and high temperature resistant protective 

film.


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